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Semiconductor showerheads

2025-05-13

InGas distribution laminam, Saepe referred to as "showerhead," ut simile conventional showerhead, sed eius pretium potest pervenire in centum milia, significantly altior quam typical balneo imber.


Et superficies Gas distribution laminam features centum vel etiam millia minima, pressius disposita foramina, simile a subtiliter texta neural network. Hoc consilio concedit ad accurate imperium of Gas influunt et iniectio angulos, ensuring quod omnis pars laganum processus regio est aequaliter "lotus" in processus Gas. Hoc non solum enhances productio efficientiam sed etiam amplio uber qualitas.


In Gas distribution laminam integralis est clavis processus ut Purgato, etching et depositione. Non directe influit accurate de semiconductor processus et qualis est finalis products, faciens eam a critica pars in variis Gas distribution applications.

Per laganum reactionem processus, superficiesshowerheadest dense operuit micropuntur (0.2-6 mm aperturae). Per pressius disposito alveus structuram et Gas iter specialis processus Gas indiget per milia parva foramina in uniformis Gas laminam et aequaliter depositum in laganum superficiem. In film layer in diversis areas de laganum necessitates ad curare princeps uniformitatem et constantia. Ideo in praeter maxime princeps requisitis ad munditiam et corrosio resistentia, in Gas distribution laminam habet stricte requisita in constantia in aperturam parva foramina in Gas distribution laminam et burgum in interiorem parietem. Si inarture amplitudo tolerantia et consistency vexillum deviationis sunt magna aut burgant in aliquo interiore muro crassitudo deposita amet layer erit diversa, quae directe afficit processus cedat apparatu.


In materia de Gas distribution laminam est aliquando fragile materiam (ut unum crystal Silicon, Vicus Vitrum, LATERAMEN), quod est facile ad conteram in actione externa. Est etiam ultra-alta foraminis intra L temporibus diametri micropore et cutting situ non potest directe observari. Insuper et secans calor non facile ad transmittere et chip remotionem difficile est, et terebro frenum facile rumpitur propter chip blockage. Igitur dispensando et praeparatio difficillimum est.


In addition, in plasma-assisted processes (such as PECVD and dry etching), the shower head, as part of the electrode, also needs to generate a uniform electric field through an RF power supply to promote uniform distribution of plasma, thereby improving the uniformity of etching or deposition.


Quia in vapores in semiconductor vestibulum processus ut sit summus temperatus, princeps pressura et mordax, in showerhead solet ex corrosio, repugnant materiae. In ipsa productio, ex alia usus missionibus et ipsam requiritur praecisione, in Gas distribution laminam potest dividitur in sequentibus duo genera secundum materiam compositionem:

(I) Metal Gas distribution laminam

Et materiae de metallum Gas distribution lamines includit aluminium mixta, immaculatam ferro et Nickel metallum, inter quae maxime late solebat metallum Gas distribution laminam materiam est aluminium mixtum, quod habet bonum scelerisque conductivity et fortis corrosio resistentia. Est late available et securus ad processum.

(II) Non-metallic Gas distribution laminam

Et materiae non-metallic Gas distribution lamines includit unum crystallum Silicon, Vicus speculum et Ceramic materiae. Inter eos, communiter usus Ceramic materiae sunt CVD, sic, alumina Ceramics, Silicon Nitride LATERAMEN, etc.





High-qualitas offert semicorexCVD sic flumine SheadheadsIn semiconductor industria. Si vos have ullus inquisitione aut opus additional details, placere non dubitant ad adepto in tactus nobiscum.


Contact Phone # + 86-13567891907

Email: Sales@Sicorex.com



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