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GaN-on-SiC Epitaxial Wafers Portitorem
  • GaN-on-SiC Epitaxial Wafers PortitoremGaN-on-SiC Epitaxial Wafers Portitorem
  • GaN-on-SiC Epitaxial Wafers PortitoremGaN-on-SiC Epitaxial Wafers Portitorem
  • GaN-on-SiC Epitaxial Wafers PortitoremGaN-on-SiC Epitaxial Wafers Portitorem
  • GaN-on-SiC Epitaxial Wafers PortitoremGaN-on-SiC Epitaxial Wafers Portitorem
  • GaN-on-SiC Epitaxial Wafers PortitoremGaN-on-SiC Epitaxial Wafers Portitorem

GaN-on-SiC Epitaxial Wafers Portitorem

Semicorex primarius sine possessore opificem Siliconis Carbide Graphite Coated, Subsecutio Machinatum Maximum puritatis Graphite positam in Graphite Silicon Carbide Coated, Silicon Carbide Ceramico, MOCVP areae semiconductoris fabricandi. Noster GaN-on-SiC laganus Epitaxial Waferus bonum pretium commodum habet et multos mercatus Europae et Americanos operit. Expectamus ad longum tempus socium in Sinis fieri.

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depictio producti

Semicorex SiC Coating of GaN-on-SiC lagana Epitaxial lagana densa est, obsistente carbide Pii (SiC) coating. Princeps corrosionis et caloris resistentiae proprietates necnon conductivity scelerisque praestantes habet. SiC in bracteis bracteis applicamus super graphite utendo depositioni vaporum chemicorum (CVD) processu.
Nostrum GaN-on-SiC laganum Epitaxiale laganum destinatur ad optimam laminae gasi fluens exemplar consequendum, aequabilitatem profile scelestae procurans. Hoc iuvat ne quis contagione vel immunditiae diffusionem praestet, ut incrementum epitaxialis summus qualitas super spumam laganum.
Contactus nos hodie ut plura discamus de nostro GaN-on-SiC Wafers Epitaxial Carrier.


Parametri GaN-on-SiC Epitaxial Wafers Portitorem

Specificationes principales de CVD-SIC Coating

Sic-CVD Properties

Crystal Structure

FCC β phase

Density

g/cm

3.21

duritia

Vickers duritia

2500

Frumenti Size

μm

2~10

Puritas chemica

%

99.99995

Calor Capacity

J kg-1 K-1

640

Sublimatio Temperature

2700

Fortitudo Felix

MPa (RT 4-punctum)

415

Modulus

Gpa (4pt bend, 1300℃)

430

Scelerisque Expansion (C.T.E)

10-6K-1

4.5

Scelerisque conductivity

(W/mK)

300


Features of Gan-on-SiC Epitaxial Wafers Portitorem

- Vitare DECORTICATIO et curare coating in omnibus superficies
Temperatus oxidationis resistentiae: Stabilis temperaturis calidis usque ad 1600°C
Alta puritas: facta per CVD depositionem vaporis chemici sub conditionibus caliditatis chlorinationis.
Corrosio resistentia: durities alta, superficies densa et particulae minutissimae.
Corrosio resistentia: acidum, alcali, sal et reagentia organica.
- Consequi optimum laminae gas fluxus exemplaris
- Guarantee aequitate profile scelerisque
- Ne quis contaminationem vel immunditiam diffusionis




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