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SiC-Coated Susceptor Ferocactus in Epitaxial Reactor Cubiculum

SiC-Coated Susceptor Ferocactus in Epitaxial Reactor Cubiculum

Semicorex's SiC-Coated Susceptor Barrel pro Cubiculo Reactoris Epitaxialis est valde certa solutio pro processibus fabricandis semiconductoris, featuring caloris superioris distributionis ac proprietatibus scelerisque conductivity. Est etiam valde repugnant corrosioni, oxidationis, et caliditatum.

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Semicorex's SiC-Coated Susceptor Barrel pro Cubiculo Reactoris Epitaxialis est productum quale premium, fabricatum ad signa summa praecisiones et durabilitas. Optimum scelerisque conductivity, corrosionem resistentiae praebet, et maxime aptum est epitaxiali reactori in fabricandis semiconductoribus.
Nostrum SiC-Coated Susceptor Barrel pro Cubiculo Reactoris Epitaxialis destinatur ad optimam laminae gasi fluens exemplar consequendum, aequabilitatem scelestae profile procurans. Hoc adiuvat ne quis contagione vel immunditiae diffusionem praestet, ut summus qualitas incrementi epitaxialis in lagano chip.
Contactus nos hodie ut plura discamus de nostro SiC-Coated Susceptore Barrel pro Cubiculo Reactoris Epitaxial.


Parametri SiC-Coated Susceptor Ferocactus in Epitaxial Reactor Cubiculi

Specificationes principales de CVD-SIC Coating .

Sic-CVD Properties

Crystal Structure

FCC β phase

Densitas

g/cm

3.21

duritia

Vickers duritia

2500

Frumenti Size

μm

2~10

Puritas chemica

%

99.99995

Calor Capacity

J kg-1 K-1

640

Sublimatio Temperature

2700

Fortitudo Felix

MPa (RT 4-punctum)

415

Modulus

Gpa (4pt bend, 1300℃)

430

Scelerisque Expansion (C.T.E)

10-6K-1

4.5

Scelerisque conductivity

(W/mK)

300


Features of Sic-Coated Susceptor Ferocactus in Epitaxial Reactor Cubiculum

- Tum graphite substrato et carbidi pii strato densitatem bonam habent et bonam munus tutelae in cultura caliditatis ac mordax operandi ambitibus ludere possunt.

- Silicon carbide obductis susceptoribus adhibitis pro incremento crystalli unius habet praealtissimae superficiei planiciem.

- Reducere differentiam in expansione scelerisque coëfficientis inter graphite substrato et carbide pii strato, efficaciter meliores compages vires ne crepuit et delaminatio.

- Tam graphite substratum et carbide pii stratum altum scelerisque conductivity habent, et caloris excellentia proprietates distributio.

- Maximum punctum liquescens, caliditas oxidationis resistentia, corrosio resistentia.




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