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Silicon Carbide SiC Coated Ferocactus Susceptor

Semicorex primarius sine possessore opificem Siliconis Carbide SiC Coated Barrel Susceptor, Subsecutio Machinatum Maximum Puritatis Graphite positam in Graphite Silicon Carbide Coated, Silicon Carbide Ceramico, MOCVP areae semiconductoris fabricandi. Nostra Silicon Carbide SiC Coated Barrel Susceptor bonum pretium commodo pretium habent et multa mercatus Europae et Americanae operiunt. Expectamus ad longum tempus socium in Sinis fieri.

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SemicorexPii Carbide SiC Coated Ferocactus Susceptorproductum est graphite altum purgatum SiC obductis, quae magno calore et corrosione resistit. LPE aptum est. ThePii CarbideSiC Coated Barrel Susceptor usus est in processibus quae epixialem iacuit in lagana semiconductoris formant, quae altam conductivity scelerisque, et proprietates excellentes caloris distributio.

Contactus nos hodie ut plura de nostro discamusPii CarbideSiC Coated Barrel Susceptor.

Morbi laoreetPii Carbide SiC CoatedBarrel Susceptor

Specificationes principales de CVD-SIC Coating .
Sic-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm	3.21
duritia	Vickers duritia	2500
Frumenti Size	μm	2~10
Puritas chemica	%	99.99995
Calor Capacity	J kg-1 K-1	640
Sublimatio Temperature	℃	2700
Fortitudo Felix	MPa (RT 4-punctum)	415
Modulus	Gpa (4pt bend, 1300℃)	430
Scelerisque Expansion (C.T.E)	10-6K-1	4.5
Scelerisque conductivity	(W/mK)	300

Features ofPii Carbide SiC CoatedBarrel Susceptor

- Tum graphite substrato et carbidi pii strato densitatem bonam habent et bonam munus tutelae in cultura caliditatis ac mordax operandi ambitibus ludere possunt.

- Silicon carbide obductis susceptoribus adhibitis pro incremento crystalli unius habet praealtissimae superficiei planiciem.

- Reducere differentiam in expansione scelerisque coëfficientis inter graphite substrato et carbide pii strato, efficaciter meliores compages vires ne crepuit et delaminatio.

- Tam graphite substratum et carbide pii stratum altum scelerisque conductivity habent, et caloris excellentia proprietates distributio.

- Maximum punctum liquescens, caliditas oxidationis resistentia, corrosio resistentia.