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News
Arida Etching nobis infectum Etching
In semiconductor fabrication, etching is one of the major steps, along with photolithography and thin-film deposition. It involves removing unwanted materials from the surface of a wafer using chemical or physical methods. This step is carried out after coating, photolithography, and developing. It ......
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De defectibus in crystallis SiC - Micropipe
Substratum SiC defectus microscopicos habere potest, ut Threading Screw Dislocation (TSD), Dislocation Edge (TED), Base Plane Luxatio (BPD), et alii. Hi defectus causantur ex deviationibus in ordine atomorum in gradu atomico. Crystalla SiC etiam dislocationes macroscopicas habere possunt, sicut incl......
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TaC Coating
Secundum investigationes eventus, TaC efficiens potest agere tutelam et iacum solitudo ad vitam componentem graphitam extendendam, caliditatem radialem uniformitatem emendare, stoichiometriam sublimationem conservare, immunditiam migrationis supprimere et consummationem energiae minuere. Ultimo a gr......
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