- English
- Español
- Português
- русский
- Français
- 日本語
- Deutsch
- tiếng Việt
- Italiano
- Nederlands
- ภาษาไทย
- Polski
- 한국어
- Svenska
- magyar
- Malay
- বাংলা ভাষার
- Dansk
- Suomi
- हिन्दी
- Pilipino
- Türkçe
- Gaeilge
- العربية
- Indonesia
- Norsk
- تمل
- český
- ελληνικά
- український
- Javanese
- فارسی
- தமிழ்
- తెలుగు
- नेपाली
- Burmese
- български
- ລາວ
- Latine
- Қазақша
- Euskal
- Azərbaycan
- Slovenský jazyk
- Македонски
- Lietuvos
- Eesti Keel
- Română
- Slovenski
- मराठी
- Srpski језик
News
Quid est fornax diffusio?
Fornax diffusio est proprietas instrumenti, adhibita sordes in lagana semiconductoris modo moderato. Hae immunditiae, dopantes appellatae, electricas proprietates semiconductores mutant, varias compositiones electronicarum formarum fieri sinunt. Haec diffusio moderata processus criticus est ad produ......
Lege plus
SiC Epitaxy
Epitaxiae duo genera sunt: homogenea et heterogenea. Ut machinas SiC cum specificis resistentia et aliis parametris ad diversas applicationes producendas, subiectae condiciones epitaxiae occurrere debent antequam productio incipiat. Qualitas epitaxy afficit artificium effectum.
Lege plus
Arida Etching nobis infectum Etching
In semiconductor fabrication, etching is one of the major steps, along with photolithography and thin-film deposition. It involves removing unwanted materials from the surface of a wafer using chemical or physical methods. This step is carried out after coating, photolithography, and developing. It ......
Lege plus
