> Products > Ceramic > Pii Carbide (SiC) > Gas Inlet Ring pro Semiconductor Equipment

Products

New Products

Gas Inlet Ring pro Semiconductor Equipment

Semicorex est magna fabrica et elit Siliconis Carbide Coated Graphite Susceptor in Sinis. Intendunt in industrias semiconductores sicut strata carbida pii et epitaxy semiconductor. Noster Gas Inlet Ring pro Semiconductor Equipment bonum pretium commodum habet et multa mercatus Europae et Americanae operit. Expectamus ad longum tempus socium in Sinis fieri.

Mitte Inquisitionem

depictio producti

Semicorex Gas Inlet Ring for Semiconductor Equipment is SiC Coated, quod est densum, obsistens carbide Pii (SiC) efficiens. Princeps corrosionis et caloris resistentiae proprietates necnon conductivity scelerisque praestantes habet. SiC in bracteis bracteis applicamus super graphite utendo depositioni vaporum chemicorum (CVD) processu.

Noster Gas Inlet Ring pro Semiconductor Equipment destinatur ad optimam laminae gasi fluens exemplar consequendum, aequabilitatem de profile scelerisque procurando. Hoc iuvat ne quis contagione vel immunditiae diffusionem praestet, ut incrementum epitaxialis summus qualitas super spumam laganum.

Contactus nos hodie ut plura discamus de nostro Gas Inlet Ringo pro Equipment Semiconductoris.

Parametri Gas Inlet Ring pro Semiconductor Equipment

Specificationes principales de CVD-SIC Coating .
Sic-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm	3.21
duritia	Vickers duritia	2500
Frumenti Size	μm	2~10
Puritas chemica	%	99.99995
Calor Capacity	J kg-1 K-1	640
Sublimatio Temperature	℃	2700
Fortitudo Felix	MPa (RT 4-punctum)	415
Modulus	Gpa (4pt bend, 1300℃)	430
Scelerisque Expansion (C.T.E)	10-6K-1	4.5
Scelerisque conductivity	(W/mK)	300