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Silicon Carbide Wafer cymba
  • Silicon Carbide Wafer cymbaSilicon Carbide Wafer cymba
  • Silicon Carbide Wafer cymbaSilicon Carbide Wafer cymba
  • Silicon Carbide Wafer cymbaSilicon Carbide Wafer cymba
  • Silicon Carbide Wafer cymbaSilicon Carbide Wafer cymba
  • Silicon Carbide Wafer cymbaSilicon Carbide Wafer cymba

Silicon Carbide Wafer cymba

Semicorex fabrum semiconductor-gradus ceramicorum tuorum OEM instrumenta fabricandi semi- laganum tractantem componunt. Nostra Silicon Carbide Wafer cymba bonum pretium commodum habet et multas mercatus Europae et Americanae operit. Expectamus ad longum tempus socium in Sinis fieri.

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Semicorex Siliconis Carbide Wafer cymba, altam puritatem (usque ad 99.99%), optimum plasma resistentiae et resistentiae caloris, et particulae strictae occurrentiae, in instrumentorum instrumentorum processui semiconductore adhibitis, inter componentibus structuralibus et instrumentis utitur.
Apud Semicorex nos intendunt ut summus qualitas, sumptus efficens cymba Silicon Carbide Wafer, prioritize satisfactio emptoris et solutiones sumptus efficaces praebeamus. Expectamus ad longum tempus socium fieri, praecipuos qualitas products et eximias servitutis emptores tradens.
Contactus nos hodie ut plura de nostro Silicon Carbide Wafer cymba discamus.


Parametri Silicon Carbide Wafer cymba

Technical Properties

Index

Unitas

Precium

Materia Nomen

Silicon Carbide reactionem Sintered

Silicon Carbide

Silicon Carbide recrystallized

Compositio

RBSiC

SSiC

R-SiC

Mole densitas

g/cm3

3

3.15 ± 0.03

2.60-2.70

Flexurae Fortitudo

MPa (kpsi)

338(49).

380(55) ;

80-90 (20°C) 90-100(1400°C)

Compressive fortitudo

MPa (kpsi)

1120 (158)

3970 (560)

> 600

duritia

Button

2700

2800

/

Fractio Tenacity

MPa m1/2

4.5

4

/

Scelerisque Conductivity

W/m.k

95

120

23

Coefficiens Scelerisque Expansion

10-6.1/°C

5

4

4.7

Imprimis Caloris

Joule/g 0k

0.8

0.67

/

Max temperatus in aere

1200

1500

1600

Modulus elasticus

Gpa

360

410

240


Discrimen inter SSiC et RBSiC;

1. Processus Sintering differt. RBSiC est liberum Si in carbidam Pii in temperatura infiltrare, SSiC reformatione naturali in 2100 graduum formatur.

2. SSiC superficiem leviorem, densitatem altiorem et vires superiores habent, ob signationes aliquas strictiores superficiei requisitas, SSiC melius erit.

3. Diversus usus temporis sub diversis PH et temperatus, SSiC est longior quam RBSiC


Features of Silicon Carbide Wafer cymba

Superior calor resistentia & scelerisque uniformitatem
SiC crystal obductis ad superficiem levem
Princeps firmitatem contra chemica purgatio
Materia designata est ut rimas et delaminationes non fiant.



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