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Wafer Carrier Semiconductor
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  • Wafer Carrier SemiconductorWafer Carrier Semiconductor

Wafer Carrier Semiconductor

Semicorex semiconductor-gradus ceramicos praebet pro tua OEM instrumentorum fabricationis semi- laganum tractantem componentes in stratis carbidi pii in stratis semiconductoris industriis. Semiconductor Wafer Carrier Carrier per multos annos fuimus et fabrica. Noster Wafer Carrier Semiconductor bonum pretium commodum habet et plurima mercatus Europae et Americanae operit. Expectamus ad longum tempus socium in Sinis fieri.

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Processus semiconductor depositionis compositione gasorum praecursoris volatilis, plasmatis, et caliditatis magni, ut membranae tenues super lagana altae qualitatis iacuit. Depositio exedrarum et laganum instrumentorum tractandorum opus ceramicum durabile est ut sustineatur ad has ambitus provocantes. Semicorex Wafer Carrier Semiconductor est summus carbide pii puritatis, quae altam corrosionem et calorem resistentiae proprietatum necnon conductivity scelerisque praestantium habet.
Contactus nos hodie ad plura discendum de Semiconductore nostro Wafer Carrier.


Parametri Wafer Portitorem semiconductorem

Technical Properties

Index

Unitas

Precium

Materia Nomen

Silicon Carbide reactionem Sintered

Silicon Carbide

Silicon Carbide recrystallized

Compositio

RBSiC

SSiC

R-SiC

Mole densitas

g/cm3

3

3.15 ± 0.03

2.60-2.70

Flexurae Fortitudo

MPa (kpsi)

338(49).

380(55) ;

80-90 (20°C) 90-100(1400°C)

Compressive fortitudo

MPa (kpsi)

1120 (158)

3970 (560)

> 600

duritia

Button

2700

2800

/

Fractio Tenacity

MPa m1/2

4.5

4

/

Scelerisque Conductivity

W/m.k

95

120

23

Coefficiens Scelerisque Expansion

10-6.1/°C

5

4

4.7

Imprimis Caloris

Joule/g 0k

0.8

0.67

/

Max temperatus in aere

1200

1500

1600

Modulus elasticus

Gpa

360

410

240


Discrimen inter SSiC et RBSiC;

1. Processus Sintering differt. RBSiC est liberum Si in carbidam Pii in temperatura infiltrare, SSiC reformatione naturali in 2100 graduum formatur.

2. SSiC superficiem leviorem, densitatem altiorem et vires superiores habent, ob signationes aliquas strictiores superficiei requisitas, SSiC melius erit.

3. Diversus usus temporis sub diversis PH et temperatus, SSiC est longior quam RBSiC


Features of Wafer Carrier Semiconductor

- inferior necem declinatio et superior chip cedit
- Tam graphite substratum et carbide pii stratum altum scelerisque conductivity habent, et caloris excellentia proprietates distributio.
- Arctius dimensionis tolerances ducunt ad altiorem productum cede ac minora costs
- Summus puritas graphita et sic efficiens pro pinhole resistentia et vita superior


Pii figurae praesto ceramicorum carbide

Virga ceramic / clavum ceramic / praeceps ceramic

Tubus ceramicus / frutex ceramic / manica ceramica

Ceramicum anulum / ceramicum washer / ceramicum spacer

Ceramic disc

Ceramic plate / ceramic scandalum

Ceramic pila

Ceramic piston

Ceramic COLLUM

Ceramicum uasculum

Alia consuetudo partium tellus




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